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Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis)
CAS: 7439-89-6 | Fe | 55.85 g/mol
Supplier: Thermo Scientific Chemicals 040855KS
Description
Iron sputtering target is used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Specifications
| Iron sputtering target | |
| 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick | |
| (metals basis) | |
| MFCD00010999 | |
| Insoluble in water. | |
| [Fe] | |
| 55.85 | |
| CHEBI:82664 |
| 1 Ea. | |
| 7439-89-6 | |
| Fe | |
| ferrum, iron, elemental, ferrous, remko, armco, ferrovac, hoeganaes eh, 3zhp, ancor b, atomiron 5m | |
| XEEYBQQBJWHFJM-UHFFFAOYSA-N | |
| iron | |
| 23925 | |
| 99.95% |
Chemical Identifiers
| 7439-89-6 | |
| 55.85 | |
| XEEYBQQBJWHFJM-UHFFFAOYSA-N | |
| 23925 | |
| iron |
| Fe | |
| MFCD00010999 | |
| ferrum, iron, elemental, ferrous, remko, armco, ferrovac, hoeganaes eh, 3zhp, ancor b, atomiron 5m | |
| CHEBI:82664 | |
| [Fe] |
Safety and Handling
H500
EINECSNumber : 231-096-4
TSCA : Yes
Recommended Storage : Ambient temperatures
RUO – Research Use Only